China exportsemi was informed that it was reported on January 12th that the first large-size semiconductor type vacuum chamber in China, developed by the Institute of Aerospace Materials and Technology of the First Academy of China Aerospace Science and Technology Corporation, has successfully passed acceptance testing. This represents a significant breakthrough for China in the field of coating equipment manufacturing for the semiconductor industry.
The vacuum chamber is a core component of coating equipment in the semiconductor industry. It enables various chemical reactions to take place in a vacuum environment, allowing for the coating and processing of semiconductor materials. Due to the fact that all chemical reactions take place inside the chamber, there are stringent requirements for the vacuum chamber in terms of its sealing capability, dimensional accuracy, and other factors.
China exportsemi net learned that, the manufacturing process of vacuum cavity is mainly include the following steps:
Material selection: choose materials with high sealing performance, low air permeability and high stability, such as stainless steel and titanium alloy.
Processing technology: adopt advanced processing technology, such as precision machining, welding, heat treatment, etc., to ensure the sealing and dimensional accuracy of the cavity.
Surface treatment: surface treatment is carried out on the cavity to improve its corrosion resistance and wear resistance.
Vacuum test: vacuum test is carried out on the cavity to ensure its sealing performance and stability.
Quality inspection: carry out strict quality inspection on the cavity to ensure that it meets the high requirements of the semiconductor industry.
Indeed, the manufacturing process of vacuum chambers requires a high level of expertise, specialized knowledge, advanced equipment, and facilities. Only manufacturers with extensive experience and capabilities can produce high-quality vacuum chambers.
To meet the demands of the semiconductor industry, the Institute of Aerospace Materials and Technology of China Aerospace Science and Technology Corporation's First Academy has dedicated several years to research, development, and breakthroughs, resulting in the successful production of this large-size semiconductor-grade vacuum chamber. The cavity adopts advanced manufacturing process and technology, has high sealing performance and dimensional accuracy, and can meet the high requirements of semiconductor industry for coating equipment. China exportsemi net express praises to China Aerospace Science and Technology Corporation.
Figure 1: Schematic diagram of semiconductor-level large-size vacuum cavity (* picture from network, for reference only)
It is understood that, Application of Semiconductor Volumetric Vacuum Cavity in Semiconductor Industry the following Chinese offshore semiconductors list some of the common applications:
Thinfilm deposition: thin film materials can be deposited on semiconductor wafers by physical or chemical methods in vacuum. The vacuum chamber provides an oxygen-free, dust-free and low-pressure environment to ensure the quality and consistency of the film.
Etching: Etching is one of the key steps in semiconductor manufacturing process, which is used to form fine patterns and structures on the wafer. The vacuum chamber may provide a vacuum condition required for etching to remove unwanted materials and form a desired circuit pattern.
Ion implantation: Ion implantation is the process of implanting impurity ions into semiconductor wafers to change their electrical properties. The vacuum chamber is used to maintain the high vacuum environment required by the implantation process to ensure the accurate implantation and control of ions.
Detection and analysis: Vacuum cavities can be used for the detection and analysis of semiconductor wafers, such as optical or electron microscope observation, spectral analysis and so on. Under vacuum condition, it can reduce external interference and pollution, and improve the accuracy and reliability of detection.
Device packaging: In the packaging process of semiconductor devices, the vacuum chamber can provide an oxygen-free and dust-free environment to prevent pollution and oxidation in the packaging process.
As evident from this, large-size semiconductor-grade vacuum chambers play a crucial role in the semiconductor manufacturing process. They provide a highly controlled environment for various process steps, ensuring the quality, performance, and reliability of semiconductor devices.
According to China Aerospace Science and Technology Corporation, the user unit of this product is the manufacturer of high-end CVD equipment facing the world, and the AP-MOCVD atmospheric pressure chemical vapor deposition equipment developed by it can solve the problem of gallium nitride coating on the core chip of high-power laser in China at present.
In 2023, the relevant divisions of Aerospace Materials and Technology Research Institute organized key technicians to set up a project team to solve the technical problems in the manufacturing process of AP-MOCVD equipment. After several months of intelligent research, the high-temperature reliable sealing and welding deformation control of long welds were solved. Through this project, user organizations have highly recognized the technical capabilities of the Institute of Aerospace Materials and Technology and have expressed their intention to collaborate in multiple high-end fields.
This achievement of China Aerospace Science and Technology Corporation marks a major breakthrough in the field of coating equipment manufacturing in the semiconductor industry in China, and provides important technical support for the development of China's semiconductor industry. At the same time, this is another important achievement of the Institute of Aerospace Materials and Technology of the Academy of China Aerospace Science and Technology Corporation in integration of defense and civilian technologies, and has made positive contributions to promoting the development of integration of defense and civilian technologies in China.
Semiconductor-grade large-size vacuum cavity technology is a highly complex and specialized field, which involves many disciplines such as material science, engineering design, processing technology and so on. At present, many countries in the world are actively developing the semiconductor industry, and have made some progress in the semiconductor-grade large-size vacuum cavity technology.
Globally, the United States, Japan, South Korea, China and other countries have strong strength and competitiveness in semiconductor-grade large-size vacuum cavity technology. Enterprises and research institutions in these countries have invested a lot of resources in semiconductor equipment manufacturing, material research and development, process optimization, etc., and made a series of technological breakthroughs and innovations.
It should be noted that the technology of semiconductor-level large-size vacuum cavity is a field of continuous development and evolution, and the technical strength and development level among countries are constantly changing. In addition, many international enterprises and research institutions also have extensive cooperation and exchanges, which jointly promote the development of semiconductor-level large-size vacuum cavity technology.
